2004 International Conference on Solid State Devices and Materials
Sep 14 - Sep 17, 2004Tower Hall Funabori, Tokyo, Japan
2004 International Conference on Solid State Devices and Materials
Sep 14 - Sep 17, 2004Tower Hall Funabori, Tokyo, Japan
[B-2-3]Etch-byproduct Pore Sealing for ALD -TaN Deposition on Porous Low-k Film
Akira Furuya, Eiichi Soda, Hiroshi Okamura, Nobuyuki Ohtsuka, Miyoko Shimada, Naofumi Ohashi, Shinichi Ogawa(1.Semiconductor Leading Edge Technologies Inc. (Selete))
