2005 International Conference on Solid State Devices and Materials
Sep 12 - Sep 15, 2005International Conference Center Kobe, Kobe, Japan
2005 International Conference on Solid State Devices and Materials
Sep 12 - Sep 15, 2005International Conference Center Kobe, Kobe, Japan
[A-1-3]Extendibility of High Mobility HfSiON Gate Dielectrics
Seiji Inumiya, Takayoshi Miura, Kiyoshi Shirai, Takeo Matsuki, Kazuyoshi Torii, Yasuo Nara(1.Semiconductor Leading Edge Technologies, Inc. (Selete), 2.Hitachi, Ltd., Central Research Laboratory)
