2005 International Conference on Solid State Devices and Materials
Sep 12 - Sep 15, 2005International Conference Center Kobe, Kobe, Japan
2005 International Conference on Solid State Devices and Materials
Sep 12 - Sep 15, 2005International Conference Center Kobe, Kobe, Japan
[A-2-2]Exact Trap Level Estimation of HfSiON Films with Various Atomic Compositions
Masahiro Koike, Tsunehiro Ino, Yuuichi Kamimuta, Yuichiro Mitani, Akira Nishiyama(1.Advanced LSI Technology Laboratory, Corporate Research&Development Center, Toshiba Corporation)
