2005 International Conference on Solid State Devices and Materials
Sep 12 - Sep 15, 2005International Conference Center Kobe, Kobe, Japan
2005 International Conference on Solid State Devices and Materials
Sep 12 - Sep 15, 2005International Conference Center Kobe, Kobe, Japan
[A-3-2]Permittivity Enhancement of Hf(1-x)SixO2 Film with High Temperature Annealing
Kazuyuki Tomida, Koji Kita, Akira Toriumi(1.Department of Materials Engineering, School of Engineering, The University of Tokyo)
