2005 International Conference on Solid State Devices and Materials
Sep 12 - Sep 15, 2005International Conference Center Kobe, Kobe, Japan
2005 International Conference on Solid State Devices and Materials
Sep 12 - Sep 15, 2005International Conference Center Kobe, Kobe, Japan
[A-3-3]Thermal Stability Improvements for HfO2 by Fluorine Implantation
Chao Sung Lai, Woei Cherng Wu, Jer Chyi Wang, Tian Sheng Chao(1.Department of Electronic Engineering, Chang Gung University, 2.Department of Electronic Physics, National Chiao Tung University, 3.Nanya Technology Corporation)
