2005 International Conference on Solid State Devices and Materials
Sep 12 - Sep 15, 2005International Conference Center Kobe, Kobe, Japan
2005 International Conference on Solid State Devices and Materials
Sep 12 - Sep 15, 2005International Conference Center Kobe, Kobe, Japan
[A-5-3]Importance of Leakage Current Noise Analysis for Accurate Lifetime Prediction of High-k Gate Dielectrics
Kenji OKADA, Hiroyuki OTA, Tsuyoshi HORIKAWA, Yasuyuki TAMURA, Takaoki SASAKI, Tomonori AOYAMA, Fumio OOTSUKA, Akira TORIUMI(1.MIRAI-ASET, AIST, 2.MIRAI-ASRC, AIST, 3.Department of Materials Science, The University of Tokyo, 4.Semiconductor Leading Edge Technologies (Selete))
