2005 International Conference on Solid State Devices and Materials
Sep 12 - Sep 15, 2005International Conference Center Kobe, Kobe, Japan
2005 International Conference on Solid State Devices and Materials
Sep 12 - Sep 15, 2005International Conference Center Kobe, Kobe, Japan
[A-6-1]A New Hf-based Dielectric Member, HfLaOx, for Amorphous High-k Gate Insulators in Advanced CMOS
Yoshiki Yamamoto, Koji Kita, Kentaro Kyuno, Akira Toriumi(1.Department of Materials Engineering, School of Engineering, The Univ. of Tokyo)
