2005 International Conference on Solid State Devices and Materials
Sep 12 - Sep 15, 2005International Conference Center Kobe, Kobe, Japan
2005 International Conference on Solid State Devices and Materials
Sep 12 - Sep 15, 2005International Conference Center Kobe, Kobe, Japan
[A-7-3]Area Selective Flash Lamp Post-Deposition Annealing of High-k Film Using Si Photo Absorber for Metal Gate MISFETs with NiSi Source/Drain
Takeo Matsuki, Isamu Nishimura, Yasushi Akasaka, Kiyoshi Hayashi, Masataka Noguchi, Koji Yamashita, Kazuyoshi Torii, Naoki Kasai, Yasuo Nara(1.Research Department 1, Semiconductor Leading Edge Technologies, Inc., 2.Rohm, 3.Renesas, 4.NEC, 5.Sanyo, 6.Hitachi)
