2005 International Conference on Solid State Devices and Materials
Sep 12 - Sep 15, 2005International Conference Center Kobe, Kobe, Japan
2005 International Conference on Solid State Devices and Materials
Sep 12 - Sep 15, 2005International Conference Center Kobe, Kobe, Japan
[A-9-4]Theoretical analysis of the Fermi level pinning in HfO2/Si system induced by the interface defect states
Minoru Ikeda, Georg Kresse, Toshihide Nabatame, Akira Toriumi(1.MIRAI, Association of Super-Advanced Electronics Technologies (ASET), 2.Institut fur Materialphysik, Univeisitat Wien, 3.MIRAI-AIST, 4.University of Tokyo)
