2005 International Conference on Solid State Devices and Materials

2005 International Conference on Solid State Devices and Materials

Sep 12 - Sep 15, 2005International Conference Center Kobe, Kobe, Japan
International Conference on Solid State Devices and Materials
2005 International Conference on Solid State Devices and Materials

2005 International Conference on Solid State Devices and Materials

Sep 12 - Sep 15, 2005International Conference Center Kobe, Kobe, Japan

[B-3-3]Device Design of High-Speed Source-Heterojunction-MOS-Transistors (SHOT) under 10-nm Regime

Tomohisa Mizuno, Shinichi Takagi(1.MIRAI-AIST, 2.Kanagawa University, 3.The University of Tokyo)
https://doi.org/10.7567/SSDM.2005.B-3-3