2006 International Conference on Solid State Devices and Materials

2006 International Conference on Solid State Devices and Materials

Sep 12 - Sep 15, 2006PACIFICO Yokohama, Yokohama, Japan
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International Conference on Solid State Devices and Materials
2006 International Conference on Solid State Devices and Materials

2006 International Conference on Solid State Devices and Materials

Sep 12 - Sep 15, 2006PACIFICO Yokohama, Yokohama, Japan

[A-3-3]Ultra high aspect ratio sub-micron silicon micromachining by double-passivation deep reactive ion etching

Ranganathan Nagarajan, B. Ramana Murthy(1.Institute of Microelectronics, Semiconductor Process Technology Laboratory)
https://doi.org/10.7567/SSDM.2006.A-3-3
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