[A-1-1]Nanowire Field Effect Transistor
Lars-Erik Wernersson(1.Solid State Physics, Lund University)
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Lars-Erik Wernersson(1.Solid State Physics, Lund University)
K. Nishiguchi, Y. Ono, A. Fujiwara, H. Yamaguchi, H. Inokawa, Y. Takahashi(1.NTT Basic Research Labs., NTT Corporation, 2.Research Institute of Electronics, 3.Graduate School of Information Science and Technology)
Li Zhang, Kazuya Ohuchi, Kanna Adachi, Mitsuhiro Tomita, Kazunari Ishimaru, Mariko Takayanagi, Akira Nishiyama(1.Advanced LSI Technology Laboratory, Corporate Research & Development Center, Toshiba Corporation, 2.Center For Semiconductor Research & Development, Toshiba Corporation Semiconductor Company)
K. Suzuki, K. Kanisawa, S. Perraud, M. Ueki, K. Takashina, Y. Hirayama(1.NTT Basic Research Laboratories, NTT Corporation, 2.Laboratoire de Photonique et de Nanostructures, CNRS, 3.NTT Electronics Techno Corporation, 4.SORST-JST, 5.Graduate School of Science, 6.Tohoku University)
Imran Mahboob, H. Okamoto, M. Ueki, H. Yamaguchi(1.NTT Basic Research Laboratories, NTT Corpration, 2.NTT Electronics Techno Inc., 3.NTT Basic Research Laboratories, NTT Corpration)
Tomoko Matsuda, Tokushi Kizuka(1.Institute of Materials Science, University of Tsukuba, 2.Special Research Project of Nanoscience, University of Tsukuba, 3.Precursory Research for Embryonic Science and Technology)
B E Kardynal, S S Hees, P See, A J Shields, I Farrer, D A Ritchie(1.Toshiba Research Europe Ltd, 2.Cavendish Laboratory, University of Cambridge)
Tetsuomi Sogawa, Hideki Gotoh, Yoshiro Hirayama, Tadashi Saku, Sen Miyashita, Paulo V. Santos, Klaus H. Ploog(1.NTT Basic Research Laboratories, NTT Corporation, 2.NTT Advanced Technology Corp., 3.Paul Drude Institute)
Shohgo Yamauchi, Amane Shikanai, Isao Morohashi, Shigenori Furue, Kazuhiro Komori, Takeyoshi Sugaya, Toshihide Takagahara(1.National Institute of Advanced Industrial Science and Technology (AIST), 2.CREST, Japan Science and Technology Corporation (JST))
K. Goshima, K. Komori, S. Yamauchi, I. Morohashi, T. Sugaya(1.National Institute of Advanced Industrial Science and Technology (AIST), 2.CREST, Japan Science and Technology Agency (JST))
J. Hayafuji, T. Kondo, H. Munekata(1.Imaging Science and Engineering Laboratory, Tokyo Institute of Technology)
Akira Satou, Victor Ryzhii, Taiichi Otsuji, Michael S. Shur(1.Computer Solid State Physics Laboratory, University of Aizu, 2.Research Institute of Electrical Communication, Tohoku University, 3.Department of Electrical, Computer, and Systems Engineering, Rensselaer Polytechnic Institute)
Yoshitada Isono(1.Department of Micro System Technlogy, Ritsumeikan University)
Chih-Ming Tai, Chien-Neng Liao(1.National Tsing-Hua University, Dept. of Materials Science and Engineering)
Ranganathan Nagarajan, B. Ramana Murthy(1.Institute of Microelectronics, Semiconductor Process Technology Laboratory)
Hironao Okada, Toshihiro Itoh, Tadatomo Suga(1.Univ. of Tokyo, Dept. of Precision Eng, School of Eng.)
Yoshiyuki Takegawa, Toru Baba, Takafumi Okudo, Yuji Suzuki(1.EMIT Devices Development Department, 2.Micro Fabrication Process Development Center, Matsushita Electric Works, Ltd.)
Gyu-Chul Yi, Won Il Park, J. Yoo, H.-J. Kim, C.-H. Lee(1.National CRI Center for Semiconductor Nanorods and Department of Materials Science and Engineering, POSTECH)
H. Hibino, K. Tateno, Y. Watanabe(1.NTT Basic Research Laboratories, NTT Corporation)
Haruki Sanada, Hideki Gotoh, Kouta Tateno, Hidetoshi Nakano(1.NTT Basic Research Laboratories, NTT Corporation)
Y. L. Foo(1.Institute of Materials Research and Engineering)
Jun Okuno, Kenzo Maehashi, Kazuhiko Matsumoto, Kagan Kerman, Yuzuru Takamura, Eiichi Tamiya(1.The Institute of Scientific and Industrial Research, Osaka University, 2.School of Materials Science, Japan Advanced Institute of Science and Technology)
Hideyuki Maki, Satoru Suzuki, Tetsuya Sato, Koji Ishibashi(1.Department of Applied Physics and Physico-Informatics, Faculty of Science and Technology, Keio University, 2.NTT Basic Research Laboratories, NTT Corporation, 3.Advanced Device Laboratory, The Institute of Physical and Chemical Research (RIKEN))
Taiji Katsura, Kenzo Maehashi, Kazuhiko Matsumoto, Kagan Kerman, Yuzuru Takamura, Eiichi Tamiya(1.The Institute of Scientific and Industrial Research, Osaka University, 2.School of Materials Science, Japan Advanced Institute of Science and Technology)
T. Umesaka, H. Ohnaka, Y. Ohno, S. Kishimoto, K. Maezawa, T. Mizutani(1.Department of Quantum Engineering, Nagoya University, 2.PRESTO, Japan Science and Technology Agency, 3.Venture Business Laboratory, Nagoya University, 4.Institute of Advanced Research, Nagoya University)
B. Yu, M. Meyyappan(1.Center for Nanotechnology, NASA Ames Research Center)
Masaharu Kobayashi, Kousuke Miyaji, Toshiro Hiramoto(1.Institute of Industrial Science, University of Tokyo)
Hirotake Maekawa, Yoshihiro Sano, Yoshiyuki Suda(1.Graduate School of Engineering, Tokyo University of Agriculture and Technology)
Kiyohito Yamada, Shigeo Yoshii, Shinya Kumagai, Atsushi Miura, Yukiharu Uraoka, Takashi Fuyuki, Ichiro Yamashita(1.Advanced Technology Research Laboratories, Matsushita Electric Industrial Co., Ltd., 2.Graduate School of Materials Science, Nara Institute of Science and Technology, 3.Core Research for Evolutional Science and Technology, Japan Science and Technology Agency)
Y. Kawata, M. Khalafalla, K. Usami, Y. Tsuchiya, H. Mizuta, S. Oda(1.Department of Physical Electronics and Quantum Nanoelectronics Research Center, Tokyo Institute of Technology, 2.SORST-JST (Japan Science and Technology))
Gou Shinkai, Toshimasa Fujisawa, Toshiaki Hayashi, Yoshiro Hirayama(1.NTT Basic Research Laboratories, NTT Corporation, 2.Department of Physics, Tokyo Institute of Techonology, 3.Department of Physics, Tohoku University, 4.SORST-JST)
R. Nuryadi, Z. A. Burhanudin, R. Yamano, T. Ishino, Y. Ishikawa, M. Tabe(1.Research Institute of Electronics, Shizuoka University, 2.Department of Materials Engineering, University of Tokyo)
Wei-Ting Lai, Pei-Wen Li(1.Department of Electrical Engineering, National Central University)
D. Moraru, Y. Ono, H. Inokawa, K. Yokoi, R. Nuryadi, H. Ikeda, M. Tabe(1.Research Institute of Electronics, Shizuoka University, 2.NTT Basic Research Laboratories, Nippon Telegraph and Telephone Corporation.)
C. K. Lee, S. J. Kim, S. J. Choi, J. H. Hwang, R. S. Chung, J. J. Lee, M. S. Kim, S. J. Shin, J. B. Choi, Y. S. Yu, H. W. Kye, B. N. Song(1.Dept. of Physics & Institute for Nano Science & Technology, Chungbuk National University, 2.Dept. of Information & Control Engineering, Hankyong National University, 3.EXCEL Semiconductor Inc.)
Woo Young Choi, Jae Young Song, Jong Pil Kim, Jong Duk Lee, Byung-Gook Park(1.Inter-University Semiconductor Research Center and School of Electrical Engineering and Computer Science, Seoul National University)
Peter Hadley, Murat Durkut(1.Kavli Institute of NanoScience)
M. A. H. Khalafalla, H. Mizuta, S. Oda, Z. A. K. Durrani(1.Quantum Nanoelectronics Research Centre, Tokyo Institute of Technology, 2.Department of Engineering, University of Cambridge)
Kei Takashina, Benjamin Gaillard, Yukinori Ono, Yoshiro Hirayama(1.NTT Basic Research Laboratories, NTT Corporation, 2.SORST-JST)
Yoshiaki. Sekine, Tatsushi. Akazaki, Junsaku. Nitta(1.NTT Basic Research Laboratories, Nippon Telegraph and Telephone Corporation, 2.Graduate School of Engineering, Tohoku University, 3.CREST-JST, Japan Science and Technology Agency)
Hiroshi Inokawa, Masao Nagase, Shigeru Hirono, Touichiro Goto, Hiroshi Yamaguchi, Keiichi Torimitsu(1.Research Institute of Electronics, Shizuoka University, 2.NTT Basic Research Laboratories, NTT Corporation, 3.NTT Afty Engineering Corporation)
Kousuke Miyaji, Toshiro Hiramoto(1.Institute of Industrial Science, University of Tokyo)
Toshihiko Baba(1.Yokohama National University, Dept. Electr. & Computer Eng.)
Masaya Notomi, Eiichi Kuramochi, Takasumi Tanabe, Hideaki Taniyama, Akihiko Shinya(1.NTT Basic Research Laboratories, NTT Corporation)
Masahiro Nomura, Satoshi Iwamoto, Katsuyuki Watanabe, Naoto Kumagai, Yoshiaki Nakata, Satomi Ishida, Yasuhiko Arakawa(1.Institute of Industrial Science, Research Center for Advanced Science and Technology, and Nanoelectronics Collaborative Research Center, University of Tokyo)
Jinsong Xia, Norita Usami, Yuta Ikegami, Yasushi Nakata, Yasuhiro Shiraki(1.Musashi Institute of Technology, Research Center for Silicon Nano-science, 2.Tohoku University, Institute for Materials Research, 3.Horiba, Ltd.)
Bernard Gelloz, Nobuyoshi Koshida(1.Graduate school of Engineering, Tokyo University of Agriculture and Technology, 2.Quantum14 Co.)
Hirohito Yamada, Tao Chu, Akiko Gomyo, Jun Ushida, Satomi Ishida, Yasuhiko Arakawa(1.NEC Corporation, Fundamental and Environmental Research Laboratories, 2.Optoelectronic Industry and Technology Development Association, 3.Univ. of Tokyo, Research Center for Advanced Science and Technology)
Yuichiro Tanushi, Shin Yokoyama(1.Research Center for Nanodevices and Systems, Hiroshima University)
M. T. Hsu, R. W. Chuang(1.Institute of Microelectronics, Department of Electrical Engineering, and Advanced Optoelectronic Technology Center (AOTC), National Cheng Kung University)