2006 International Conference on Solid State Devices and Materials

2006 International Conference on Solid State Devices and Materials

Sep 12 - Sep 15, 2006PACIFICO Yokohama, Yokohama, Japan
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International Conference on Solid State Devices and Materials
2006 International Conference on Solid State Devices and Materials

2006 International Conference on Solid State Devices and Materials

Sep 12 - Sep 15, 2006PACIFICO Yokohama, Yokohama, Japan

[J-2-2]Pd2Si Fully-Silicided Gate: Kinetics of Silicide Formation and Workfunction Tuning

Takuji Hosoi, Kosuke Sano, Kosei Hosawa, Kentaro Shibahara(1.Research Center for Nanodevices and Systems, Hiroshima University)
https://doi.org/10.7567/SSDM.2006.J-2-2
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