[A-2-4]Fabrication of HfOxNy dielectrics on Ge from HfNx deposition
Tatsuro Maeda, Yukinori Morita, Shinichi Takagi(1.MIRAI, Advanced Semiconductor Research Center - National Institute of Advanced Industrial Science and Technology (ASRC-AIST), AIST Tsukuba Central 4, 2.The University of Tokyo)
