2007 International Conference on Solid State Devices and Materials
Sep 18 - Sep 21, 2007Tsukuba International Congress Center (EPOCHAL TSUKUBA), Ibaraki, Japan
2007 International Conference on Solid State Devices and Materials
Sep 18 - Sep 21, 2007Tsukuba International Congress Center (EPOCHAL TSUKUBA), Ibaraki, Japan
[A-6-1]Effects of O2 Plasma Treatment on the Reliabilities of Metal Gate/High-k Dielectric MOSFETs
Kyong Taek Lee, Chang Yong Kang, Rino Choi, Seung Chul Song, Byoung Hun Lee, Hi-Deok Lee, Yoon-Ha Jeong(1.Dept. of Electronic and Electrical Engineering, Pohang University of Science and Technology (POSTECH), 2.SEMATECH, 3.IBM assignee, 4.Dept. of Electronics Engineering, Chungnam National Univ, Korea, 5.University of Texas at Austin)
