[A-6-3]A Comparative Study of Plasma Source-Dependent Charging Polarity in MOSFETs with High-k and SiO2 Gate Dielectrics
Koji Eriguchi, Masayuki Kamei, Daisuke Hamada, Kenji Okada, Kouichi Ono(1.Graduate School of Engineering, Kyoto University, 2.MIRAI-AIST)
