[A-9-2]Effectiveness of Aluminum Incorporation in Nickel Silicide and Nickel Germanide Metal Gates for Work Function Reduction
Andy E.-J. Lim, Rinus T.P. Lee, Alvin T.Y. Koh, Ganesh S. Samudra, Dim-Lee Kwong, Yee-Chia Yeo(1.Silicon Nano Device Lab., Dept. of Electrical & Computer Engineering, National University of Singapore)
