2009 International Conference on Solid State Devices and Materials
Oct 6 - Oct 9, 2009Sendai Kokusai Hotel, Miyagi, Japan
2009 International Conference on Solid State Devices and Materials
Oct 6 - Oct 9, 2009Sendai Kokusai Hotel, Miyagi, Japan
[A-3-3]Carbon Profile Engineering for Silicon-Carbon Source/Drain Stressor Formed by Carbon Ion Implantation and Solid Phase Epitaxy
Q. Zhou1, S. M. Koh1, Z. Y. Zhao2, T. Toh2, H. Maynard2, N. Variam2, T. Henry2, Y. Erokhin2, Y. C. Yeo1(1.National Univ. of Singapore(Singapore), 2.Varian Semiconductor(USA))
