2009 International Conference on Solid State Devices and Materials

2009 International Conference on Solid State Devices and Materials

Oct 6 - Oct 9, 2009Sendai Kokusai Hotel, Miyagi, Japan
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International Conference on Solid State Devices and Materials
2009 International Conference on Solid State Devices and Materials

2009 International Conference on Solid State Devices and Materials

Oct 6 - Oct 9, 2009Sendai Kokusai Hotel, Miyagi, Japan

[A-3-5L]Stress variability control by defects suppression of SiGe Source/Drain using novel SiGe epitaxial growth technique

M. Fukuda1, Y. Shimamune1, M. Nakamura1, K. Tanahashi1, T. Miyashita1, M. Nishikawa1, N. Tamura1, T. Mori1, Y. Nara1, M. Kase1(1.Fujitsu Microelectronics Ltd.)
https://doi.org/10.7567/SSDM.2009.A-3-5L
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