2009 International Conference on Solid State Devices and Materials

2009 International Conference on Solid State Devices and Materials

Oct 6 - Oct 9, 2009Sendai Kokusai Hotel, Miyagi, Japan
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International Conference on Solid State Devices and Materials
2009 International Conference on Solid State Devices and Materials

2009 International Conference on Solid State Devices and Materials

Oct 6 - Oct 9, 2009Sendai Kokusai Hotel, Miyagi, Japan

[B-1-4]Impact of Si Oxidation States on Dipole Layer at HfO2/Si Interface

N. Miyata1,2, Y. Abe2, T. Yasuda1(1.AIST(Japan), 2.Musashi Inst. Of Tech.(Japan))
https://doi.org/10.7567/SSDM.2009.B-1-4
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