2009 International Conference on Solid State Devices and Materials
Oct 6 - Oct 9, 2009Sendai Kokusai Hotel, Miyagi, Japan
2009 International Conference on Solid State Devices and Materials
Oct 6 - Oct 9, 2009Sendai Kokusai Hotel, Miyagi, Japan
[B-2-6L]In Situ Si Wafer Surface Temperature Measurement during Flash Lamp Annealing
Y. Yamada1, T. Aoyama2, H. Chino3, K. Hiraka3, J. Ishii1, S. Kadoya3, S. Kato2, H. Kiyama4, H. Kondo4, T. Kuroiwa4, K. Matsuo4, T. Owada5, T. Shimizu3, T. Yokomori5(1.AIST(Japan), 2.Semiconductor Leading Edge Tech. Inc.(Japan), 3.Chino Corp.(Japan), 4.Dainippon Screen Manufac. Co. Ltd.(Japan), 5.Ushio Inc.(Japan))
