International Conference on Solid State Devices and Materials

2009 International Conference on Solid State Devices and Materials

Oct 6 - Oct 9, 2009Sendai Kokusai Hotel, Miyagi, Japan

International Conference on Solid State Devices and Materials

2009 International Conference on Solid State Devices and Materials

Oct 6 - Oct 9, 2009Sendai Kokusai Hotel, Miyagi, Japan

[B-5-2]Effect of Post Cap-Layer Deposition Annealing Temperature and TiN Thickness on SMDH CMOS Process using TiN Hard Mask

H. Shinohara¹, A. Katakami¹, T. Watanabe¹, M. Hayashi¹, S. Kamiyama¹, Y. Sugita¹, T. Matsuki¹, T. Eimori¹, J. Yugami¹, K. Ikeda¹, Y. Ohji¹(1.Selete)

https://doi.org/10.7567/SSDM.2009.B-5-2