International Conference on Solid State Devices and Materials
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2009 International Conference on Solid State Devices and Materials
Oct 6
- Oct 9, 2009
Sendai Kokusai Hotel, Miyagi, Japan
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2009 International Conference on Solid State Devices and Materials
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2009 International Conference on Solid State Devices and Materials
Oct 6
- Oct 9, 2009
Sendai Kokusai Hotel, Miyagi, Japan
[B-6-3]
First LSI Applicable Thin SOI Films Formed by Lateral Solid Phase Epitaxy
H. Ishida
1
, F. Aiso
1
, M. Mizukami
1
, K. Nishihara
1
, T. Iguchi
1
, D. Ichinose
1
, A. Fukumoto
1
, T. Suzuki
1
, F. Arai
1
, I. Mizushima
1
(1.Toshiba Corp.)
https://doi.org/10.7567/SSDM.2009.B-6-3
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