2011 International Conference on Solid State Devices and Materials
Sep 27 - Sep 30, 2011Aichi Industry & Labor Center (WINC AICHI), Nagoya, Japan
2011 International Conference on Solid State Devices and Materials
Sep 27 - Sep 30, 2011Aichi Industry & Labor Center (WINC AICHI), Nagoya, Japan
[A-5-3]Effects of Excimer Laser annealing of Oxide Semiconductor Films
M. Fujii1, R. Ishihara2, T. Chen2, J. Van der Cingel2, M. R. T. Mofrad2, M. Kasami3, K. Yano3, M. Horita1,4, Y. Ishikawa1,4, Y. Uraoka1,4(1.NAIST , Japan, 2.Delft University of Technology , The Netherlands, 3.Idemitsu Kosan Co., Ltd., 4.CREST-JST , Japan)
