2013 International Conference on Solid State Devices and Materials

2013 International Conference on Solid State Devices and Materials

Sep 24 - Sep 27, 2013Hilton Fukuoka Sea Hawk, Fukuoka, Japan
International Conference on Solid State Devices and Materials
2013 International Conference on Solid State Devices and Materials

2013 International Conference on Solid State Devices and Materials

Sep 24 - Sep 27, 2013Hilton Fukuoka Sea Hawk, Fukuoka, Japan

[B-1-2]Thermal and Plasma Treatments for Improved (Sub-)1nm EOT Planar and FinFET-based RMG High-k Last Devices and Enabling a Simplified Scalable CMOS Integration Scheme

A. Veloso1, G. Boccardi1, L.A. Ragnarsson1, Y. Higuchi2, H. Arimura1,3, J.W. Lee1,3, E. Simoen1, M.J. Cho1, Ph.J. Roussel1, V. Paraschiv1, X. Shi1, T. Schram1, S.A. Chew1, S. Brus1, A. Dangol1, E. Vecchio1, F. Sebaai1, K. Kellens1, N. Heylen1, K. Devriendt1, H. Dekkers1, A. Van Ammel1, T. Witters1, T. Conard1, I. Vaesen1, O. Richard1, H. Bender1, R. Athimulam1, A. Thean1, N. Horiguchi1(1.Imec, 2.Panasonic, 3.K. U. Leuven (Belgium))
https://doi.org/10.7567/SSDM.2013.B-1-2