International Conference on Solid State Devices and Materials

2013 International Conference on Solid State Devices and Materials

Sep 24 - Sep 27, 2013Hilton Fukuoka Sea Hawk, Fukuoka, Japan

International Conference on Solid State Devices and Materials

2013 International Conference on Solid State Devices and Materials

Sep 24 - Sep 27, 2013Hilton Fukuoka Sea Hawk, Fukuoka, Japan

[B-1-3]Si:C-S/D Engineering using Cascade C₇H_x Implantation Followed by Rapid Solid-Phase Epitaxy and Laser Annealing for nMOSFET with Highly-Strained and Low-Resistive S/D

T. Yamaguchi¹, Y. Kawasaki¹, T. Yamashita¹, Y. Nishida¹, M. Mizuo², K. Maekawa¹, M. Fujisawa¹(1.Renesas Electronics Corp., 2.Renesas Semiconductor Engineering Corp. (Japan))

https://doi.org/10.7567/SSDM.2013.B-1-3