2013 International Conference on Solid State Devices and Materials

2013 International Conference on Solid State Devices and Materials

Sep 24 - Sep 27, 2013Hilton Fukuoka Sea Hawk, Fukuoka, Japan
International Conference on Solid State Devices and Materials
2013 International Conference on Solid State Devices and Materials

2013 International Conference on Solid State Devices and Materials

Sep 24 - Sep 27, 2013Hilton Fukuoka Sea Hawk, Fukuoka, Japan

[B-1-4]Impact of Additional Pt on Channel Stress Induced by NiSi Film Formation

M. Mizuo1, T. Yamaguchi2, S. Kudo2, Y. Hirose1,2, H. Kimura2, J. Tsuchimoto2, N. Hattori2(1.Renesas Semiconductor Engineering Corp., 2.Renesas Electronics Corp. (Japan))
https://doi.org/10.7567/SSDM.2013.B-1-4