[A-5-01] Enhancement of Ferroelectricity in 5-nm HZO Metal-Ferroelectric-Insulator-Semiconductor Technologies by Using Strained TiN Electrode
〇Cheng-Hung Wu1, Kuan-Chi Wang1, Yu-Yun Wang1, Tian-Li Wu1, Chun-Jung Su2, Yao-Jen Lee2, Chenming Hu1,3(1.National Yang Ming Chiao Tung Univ., 2.Taiwan Semiconductor Research Inst., 3.Univ. California, Berkeley )
