[A-7-06] Attainment of Low Dit and Reliable High-Ge-Content Si1-xGex Gate Stacks via Low-Temperature Grown Ultra-Thin Epitaxial Si
〇HsienWen Wan1, Yi-Ting Cheng1, Chao-Kai Cheng1, Yu-Jie Hong1, Tien-Yu Chu1, Chien-Ting Wu2, Jueinai Kwo3, Minghwei Hong1(1.National Taiwan Univ., 2.Taiwan Semiconductor Res. Inst., 3.National Tsing Hua Univ.)
