[B-2-01 (Invited)]Metrology to Support Processing and Development of 4H-SiC CMOS and Power Devices at Fraunhofer IISB from Research to Multi Project Wafer Services
〇Mathias Rommel1, Tobias Erlbacher1(1. Fraunhofer Inst. for Integrated Systems and Device Tech. IISB (Germany))
Presentation style: Online
