[A-4] Advanced CMOS: Device Technology

11:15 AM - 11:30 AM JST(2:15 AM - 2:30 AM UTC)

[A-4-03] Te-based layered materials for Fermi-level Depinning on n-Ge

〇Wen Hsin CHANG¹, Shogo HATAYAMA¹, Naoya OKADA¹, Toshifumi IRISAWA¹, Yuta SAITO^1,2 (1. AIST (Japan), 2. Tohoku Univ. (Japan))

DOI:

https://doi.org/10.7567/SSDM.2024.A-4-03

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