[J-1-02]Bringing Superconducting Al Overlap Josephson Junction Fabrication from Lab to Fab
〇Shana Massar1, Tsvetan Ivanov1, Yann Canvel1, Daniel Perez Lozano1, Jacques Van Damme1,2, Stefan Kubicek1, Julien Jussot1, Diziana Vangoidsenhoven1, Yannick Hermans1, Antoine Pacco1, Ju-Geng Lai1, Rohith Acharya1, Vadiraj Rao1, Massimo Mongillo1, Anton Potočnik1, Danny Wan1, Kristiaan De Greve1,2(1. IMEC (Belgium), 2. Katholieke Univ. Leuven (Belgium))
A high yield 300 mm Al overlap Josephson junction process was developed in IMEC’s pilot line for quantum computing applications. Initial process development relied on ebeam lithography and later, on 193nm immersion optical lithography. Electrical measurements and physical inspections of the junctions highlight the impact of process variations on devices.
