[K-2] Oxide-TFTs II

4:15 PM - 4:45 PM JST(7:15 AM - 7:45 AM UTC)Invited

[K-2-01 (Invited)] High Mobility Thin film Transistors for Three Dimensional LSIsfabricated by ALD process

Takanori Takahashi¹, 〇Yukiharu Uraoka¹ (1. Nara Institute of Science and Technology (Japan))

DOI:

https://doi.org/10.7567/SSDM.2024.K-2-01

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