Presentation Information

[PC-29]Fabrication and Modification of WO3 Nanostructure Photoanode by HWCVD for Photoelectrochemical Water Splitting

*Siteng Lin1, Quan Shi1, Qi Xue1, Yuki Hayashi1, Shin Kajita1 (1. The University of Tokyo (Japan))

Keywords:

Hot wire chemical vapor deposition,Tungsten oxide,Photoelectrochemical water splitting


Comment

To browse or post comments, you must log in.Log in