The 38th International Conference of Photopolymer Science and Technology
2021年6月15日〜7月14日オンライン開催
The 38th International Conference of Photopolymer Science and Technology
2021年6月15日〜7月14日オンライン開催
[A-15][Invited] Defect Mitigation in Sub-20 nm Patterning with High-Chi Silicon Containing Block Copolymers
Jan Doise (1), Jai Hyun Koh (2), Ji Yeon Kim (2), Qingjun Zhu (2), Natsuko Kinoshita (2), Hyo Seon Suh (1), Paulina Rincon Delgadillo (1), Geert Vandenberghe (1), C. Grant Willson (2), 〇Christopher J. Ellison (3)((1) IMEC, (2) University of Texas at Austin, (3) University of Minnesota)