フォトポリマー学会

[OP-1-1]Opening Remarks

Takeo Watanabe(Symposium Chair of EUV Lithography, the Symposium of most contributing to Journal of Photopolymer Science and Technology, 33 (2020))

[PS-1-1]EUV Lithography toward 10 nm and below
–Prospect of Achievement for Both Highly Sensitive and low LWR EUV Resist–

[PS-2-2]Biomimetics: Learn from Nature

[A-1]Development of Materials Infomatics Platform

Yasumitsu Orii, Hiroyuki Toda, Shuichi Hirose, Masakazu Kobayashi(NAGASE)

[A-2][Invited] Design of a Hairpin DNA-Gold Nanoparticle Monoconjugate with a Single-Dye Molecule for Targetable Molecular Beacon Strategies

Akane Mukaida (1), Rihito Adachi (1), 〇Yoshitsugu Akiyama (2), Masao Kamimura (1)((1) Department of Materials Science and Technology, Graduate School of Industrial Science and Technology, Tokyo University of Science, (2) Faculty of Industrial Science and Technology, Tokyo University of Science)

[A-3]Experimental Evaluation and Modeling of Adsorption Phenomena of Nanoliposomes on Poly(dimethylsiloxane) Surfaces

Sylvan Sunny Koyagura (1), Virendra Majarikar (1), Hiroaki Takehara (1,2), Takanori Ichiki (1,2)((1) The University of Tokyo, (2) Innovation Center of NanoMedicine (iCONM))

[A-4]Near-Infrared Afterglow Ceramic Fluorophore Coupled with Dyes in Polymer Matrix

Shengjie Fang, 〇Masakazu Umezawa, Kyohei Okubo, Kohei Soga(Tokyo University of Science)

[A-5]Photopolymerization Triggered by Upconversion Emission for Hydrophobic Shell Coating on Lanthanide-Doped NaYF4 Nanoparticle Surface

Kyohei Okubo, Takaya Yamada, Hikaru Haraguchi, Masao Kamimura, Masakazu Umezawa, Kohei Soga(Tokyo University of Science)

[A-6]Characterization of Bipolar Electrospinning and Its Application to Nanofiber Assembly

Naoya Takahashi (1), Hiroaki Takehara (1,2), Takanori Ichiki (1,2)((1) The University of Tokyo, (2) Innovation Center of NanoMedicine (iCONM))

[A-7]Effects of Physico-chemical Treatments on Interconnections among PLGA 50:50 Electrospun Nanofibers

Afraz Khan (1), Yuki Hadano (1), Hiroaki Takehara (1,2), Takanori Ichiki (1,2),((1) The University of Tokyo, (3) Innovation Center of NanoMedicine (iCONM))

[A-8]Microfabrication process of metal wires on poly(l-lactide)(PLLA) substrates using laser ablation

Kazuki Shimada (1), Hiroaki Takehara (1,2), Takanori Ichiki (1,2)((1) The University of Tokyo, (4) Innovation Center of NanoMedicine (iCONM))

[A-9]Elastoplastic finite element analysis of polymer microneedles with high aspect ratio

Mizuki Inada (1), Yukihiro Kanda (1), Hiroaki Takehara (1, 2), Takanori Ichiki (1, 2)((1) The University of Tokyo, (5) Innovation Center of NanoMedicine (iCONM))

[A-10][Keynote Lecture] A New Technology for Back-illuminated Complementary Metal Oxide Semiconductor Image Sensor Integrated by Directed Self Assembly Process

Itaru Oshiyama, Takushi Shigetoshi, Isao Mita, Nobuto Sumitani, Takashi Oinoue, Suguru Saito, Tatsuya Okawa, Yoshiki Ebiko, Kaito Yokochi, Yoshiaki Kitano, Yoshiya Hagimoto, Tomoyuki Hirano, Hayato Iwamoto(Sony Semiconductor Solutions)

[A-11][Keynote Lecture] Next-Generation Directed Self-Assembly for Moore's Law Scaling

Florian Gstrein(Intel)

[A-12][Invited] Self-Assembly of Carbohydrate-based Block Copolymers : Highly Nanostructured Thin Films

Redouane Borsali(University Grenoble Alpes - CNRS)

[A-13][Invited] Development of Directed Self-Assembly Process toward High Volume Manufacturing

Hyo Seon Suh(IMEC)

[A-14][Invited] Recent Progress on DSA at CEA-Leti

Guido Rademaker, Aurélie Le Pennec, Marie-Line Pourteau, Tommaso Giammaria, Khatia Benotmane, Hanh Pham, Maria-Gabriëla Gusmão Cacho, Ahmed Gharbi, Maxime Argoud, Nicolas Posseme, Raluca Tiron(University Grenoble Alpes, CEA, Leti)

[A-15][Invited] Defect Mitigation in Sub-20 nm Patterning with High-Chi Silicon Containing Block Copolymers

Jan Doise (1), Jai Hyun Koh (2), Ji Yeon Kim (2), Qingjun Zhu (2), Natsuko Kinoshita (2), Hyo Seon Suh (1), Paulina Rincon Delgadillo (1), Geert Vandenberghe (1), C. Grant Willson (2), 〇Christopher J. Ellison (3)((1) IMEC, (2) University of Texas at Austin, (3) University of Minnesota)

[A-16][Invited] Multi-functional Top-Coats Strategy for DSA of High-χ Block Copolymers

Xavier Chevalier (1), Cindy Gomes Correia (2), Gwenaelle Pound-Lana (3), Philippe Bézard (3) (4), Matthieu Sérégé (3), Camille Petit-Etienne(3), Guillaume Gay (3), Gilles Cunge(3), Benjamin Cabannes-Boué (2), Célia Nicolet (1), Christophe Navarro (1), Ian Cayrefourcq (1)(5), Marcus Müller (6), Georges Hadziioannou (2), Ilias Iliopoulos (7), Guillaume Fleury (2), Marc Zelsmann (3)((1) ARKEMA, (2) University Bordeaux, (3) University Grenoble Alpes, CNRS, CEA/LETI Minatec, (4) IMEC, (5) I-TEN SA, (6) Georg-August Universität Göttingen, Institute for Theoretical Physics, (7) Laboratoire PIMM, Arts et Métiers Institute of Technology, CNRS, Cnam, HESAM Université)

[A-17][Invited] Electric-Field Directed Orientation in Fluorine-Containing Block Copolymer Films

Du Yeol Ryu, Seongjun Jo, Seungbae Jeon, Taesuk Jun, Hui Il Jeon(Yonsei University)

[A-18][Invited] EUV Stochastics: CD variability and Pattern Failures

Peter De Bisschop(IMEC)

[A-19][Invited] Stochastic Photoresist Defect Formation: An In Silico Investigation

Lawrence S. Melvin III, Hironobu Taoka, Ulrich Welling,
Wolfgang Demmerle, Hans-Jurgen Stock(Synopsys)

[A-20][Invited] Resist Thickness Dependence of Latent Images in Chemically Amplified Resists used for Electron Beam Lithography

Takahiro Kozawa (1), Takao Tamura (2)((1) Osaka University, (2) NuFlare Technology)

[A-21][Invited] Tight-Binding Quantum Chemical Molecular Dynamics Simulations on Atomistic Mechanism of Plasma Etching Processes

Momoji Kubo(Tohoku University)

[A-22][Invited] Computational Study of Stochastic Effects in Extreme Ultraviolet Lithography

Masaaki Yasuda, Masanori Koyama, Kyohei Imai, Masamitsu Shirai, Yoshihiko Hirai(Osaka Prefecture University)

[A-23][Invited] Multiscale Polymer Simulations with Automated Coarse-graining Technique and Quantum Annealing

Kenji Yoshimoto(Toray)

[A-24]Stochastic Simulation of Development Process in Electron Beam Lithography

Bunta Inoue (1), Masanori Koyama (1), Atsushi Sekiguchi (2), Masamitsu Shirai (1), Yoshihiko Hirai (1), Masaaki Yasuda (1)((1) Osaka Prefecture University, (2) Litho Tech Japan)

[A-25]Computational Lithography for 3-Dimensional Fine Photolithography using Sophisticated Built-in Lens Mask

Tomoaki Osumi, Akio Misaka, Kousuke Sato, Masaaki Yasuda, Masaru Sasago, Yoshihiko Hirai(Osaka Prefecture University)

[A-26][Keynote Lecture] Fundamental Evaluation of Resist on EUV Lithography at New SUBARU Synchrotron Light Facility

Takeo Watanabe, Tetsuo Harada, Shinji Yamakawa(University of Hyogo)

[A-27]The Research and Development Progress of the High Power LPP-EUV Light Source

Koichiro Koge, Hirokazu Hosoda, Shinji Nagai, Yoshifumi Ueno, Takashi Suganuma, Takayuki Yabu, Tatsuya Yanagida, Yutaka Shiraishi, Hiroaki Nakarai, Hakaru Mizoguchi(Gigaphoton)

[A-28][Invited] High-NA EUV Lithography Exposure Tool: Providing High Contrast to Resist

Gijsbert Rispens, Jan van Schoot, Ruben Maas, Eelco van Setten, Kars Troost, Rudy Peeters, Sjoerd Lok, Jo Finders(ASML)

[A-29]Progress and Outlook towards High-NA EUV Materials

Jara G. Santaclara (1), Gijsbert Rispens (1), Joost Bekaert (2), Arame Thiam (2), Mark Maslow (1), Rik Hoefnagels (1)((1) ASML, (2) IMEC)

[A-30][Invited] Challenges in Pushing EUV Lithography to the Atomic Scale

Patrick Naulleau(Berkeley Lab.)

[A-31][Invited] Photoresist Readiness for N3/N2 Double Patterning in EUV lithography

Danilo De Simone, Stefan Decoster(IMEC)

[A-32][Invited] Novel EUV Resist Materials with Improved Stochastics - A Progress Report

Florian Gstrein(Intel)

[A-33][Invited] The Status of Stochastic Issues in EUV Lithography, Photon Stochastic and Chemical Stochastic

Toru Fujimori(Fujifilm)

[A-34][Invited] Randomness of Polymer Microstructure in the Resist Film as Shot Noise

Makoto Muramatsu (1), Satoru Shimura (2), Arisa Hara (2)((1) Advanced Technology Development Department, Tokyo Electron Kyushu, (2) Process Technology Department, Tokyo Electron Kyushu)

[A-35]Surface Variation Characterization on Chemical Amplified Photoresist for Extreme Ultraviolet Lithography Stochastic Effects

Eric C. Liu, Amir Hegazy, Hyeonseon Choi, Robert Brainard, Gregory Denbeaux(State University of New York, Polytechnic Institute)

[A-36]Affinity Analysis of Photoacid Generator in the Thin Film of Chemical Amplification Resist by Contact Angle Measurement

Shinji Yamakawa (1), Ako Yamamoto (1), Seiji Yasui (2), Takeo Watanabe (1), Tetsuo Harada (1)((1) University of Hyogo, (2) San-Apro)

[A-37][Invited] New Approaches to EUV Photoresists: Expanding the Polymer Toolbox

Jingyuan Deng (1), Florian Kaefer (2), Sean Bailey (2), Yusuke Otsubo (2,3), 〇Christopher K. Ober (2)((1) Department of Chemistry and Chemical Biology, Cornell University, (2) Department of Materials Science & Engineering, Cornell University, (3) JSR)

[A-38][Invited] Multi-Trigger Resist for EUV Lithography

C. Popescu (1), G. O'Callaghan (1), A. McClelland (1), J. Roth (2), T. Lada (2), T. Kudo (3), R. Dammel (3), M. Moinpour (3), Y. Cao (3), 〇A.P.G. Robinson (1)((1) Irresistible Materials, (2) Nano-C, (3) EMD Performance Materials)

[A-39][Invited] EUV Photochemistry of α-Substituted Antimony Carboxylate Complexes

Michael Murphy, Maximilian Weires, Nitinkumar S. Upadhyay, Philip Schuler, Shaheen Hasan, Greg Denbeaux, Robert L. Brainard(State University of New York, Polytechnic Institute)

[A-40]Development of Negative-Type Molecular Ion Resist Materials using Polarity Change by EUV Exposure

Kohei Fujisawa (1), Hiroyuki Maekawa (1), Hiroto Kudo (1), Kazumasa Okamoto (2), Takahiro Kozawa (2)((1) Kansai University, (2) Osaka University)

[A-41]Progress in EUV Photoresists for High-Resolution Patterning

Yusuke Otsubo (1,2), Hong Xu (1), Emmanuel P. Giannelis (1), Christopher K. Ober (1)((1) Cornell University, (2) JSR)

[A-42][Invited] Study on Irradiation Effects by Femtosecond-pulsed Extreme Ultraviolet in Resist Materials

Hiroki Yamamoto, Yuji Hosaka, Masahiko Ishino, Thanh-Hung Dinh, Masaharu Nishikino, Yasunari Maekawa(National Institutes for Quantum and Radiological Science and Technology (QST))

[A-43][Invited] A Holistic Approach to Understanding the Ultrafast Molecular Dynamics of Resist During EUV Exposure: An Introduction to IMEC's AttoLab for Ultrafast Kinetics and Sub-20 nm Pitch Lithography

John Petersen (1), Kevin M. Dorney (1), Fabian Holzmeier (1), Esben W. Larsen (1), Thomas Nuytten (1), Dhirendra P. Singh (1), Michiel van Setten (1), Pieter Vanelderen (1), Clayton Bargsten (2), Seth L. Cousin (2), Daisy Raymondson (2), Eric Rinard (2), Rod Ward (2), Henry Kapteyn (2,3), Stefan Böttcher (4), Oleksiy Dyachenko (4), Raimund Kremzow (4), Marko Wietstruk (4), Geoffrey Pourtois (1), Paul van der Heide (1)((1) IMEC, (2) KM Labs, (3) University of Colorado Boulder and NIST, (4) SPECS GmbH)

[A-44]Evolution of Secondary Electrons Emission During EUV Exposure in Photoresists

Roberto Fallica (1), Stefano Nannarone (2), Nicola Mahne (2), Andrea Marco Malvezzi (2), Danilo De Simone (1)((1) IMEC, (2) CNR-IOM synchrotron beamline BEAR (Elettra synchrotron))

[A-45]The Measurement of the Refractive Index n and k Value of the EUV Resist by EUV Reflectivity Measurement Method

Yosuke Ohta (1), Jun Sekiguchi (1), Shota Niihara (2), Tetsuo Harada (2), Takeo Watanabe (2)((1) Litho Tech Japan, (2) University of Hyogo)

[A-84]Polymerizable Olefins Groups in Antimony EUV Photoresists

Michael Murphy, Nitinkumar S. Upadhyay, Munsaf Ali, James Passarelli, Jodi
Grzeskowiak, Maximillian Weires, Robert L. Brainard(State University of New York, Polytechnic Institute)

[A-46][Invited] Resin Deformation Analysis in UV Imprint Considering UV Shrinkage, Thermal Deformation, and Thermochemical Kinetics

Yuki Onishi (1), Ryunosuke Yamashita (1), Kenji Amaya (1), Yoshihiko Hirai (2)((1) Tokyo Institute of Technology, (2) Osaka Prefecture University)