The 38th International Conference of Photopolymer Science and Technology
2021年6月15日〜7月14日オンライン開催
The 38th International Conference of Photopolymer Science and Technology
2021年6月15日〜7月14日オンライン開催
[A-20][Invited] Resist Thickness Dependence of Latent Images in Chemically Amplified Resists used for Electron Beam Lithography
Takahiro Kozawa (1), Takao Tamura (2)((1) Osaka University, (2) NuFlare Technology)