[A-24]Stochastic Simulation of Development Process in Electron Beam Lithography
Bunta Inoue (1), Masanori Koyama (1), Atsushi Sekiguchi (2), Masamitsu Shirai (1), Yoshihiko Hirai (1), Masaaki Yasuda (1)((1) Osaka Prefecture University, (2) Litho Tech Japan)