The 38th International Conference of Photopolymer Science and Technology
2021年6月15日〜7月14日オンライン開催
The 38th International Conference of Photopolymer Science and Technology
2021年6月15日〜7月14日オンライン開催
[A-38][Invited] Multi-Trigger Resist for EUV Lithography
C. Popescu (1), G. O'Callaghan (1), A. McClelland (1), J. Roth (2), T. Lada (2), T. Kudo (3), R. Dammel (3), M. Moinpour (3), Y. Cao (3), 〇A.P.G. Robinson (1)((1) Irresistible Materials, (2) Nano-C, (3) EMD Performance Materials)
30min.