The 38th International Conference of Photopolymer Science and Technology
2021年6月15日〜7月14日オンライン開催
The 38th International Conference of Photopolymer Science and Technology
2021年6月15日〜7月14日オンライン開催
[A-40]Development of Negative-Type Molecular Ion Resist Materials using Polarity Change by EUV Exposure
Kohei Fujisawa (1), Hiroyuki Maekawa (1), Hiroto Kudo (1), Kazumasa Okamoto (2), Takahiro Kozawa (2)((1) Kansai University, (2) Osaka University)