[A-43] [Invited] A Holistic Approach to Understanding the Ultrafast Molecular Dynamics of Resist During EUV Exposure: An Introduction to IMEC's AttoLab for Ultrafast Kinetics and Sub-20 nm Pitch Lithography | The 38th International Conference of Photopolymer Science and Technology

The 38th International Conference of Photopolymer Science and Technology

2021年6月15日〜7月14日オンライン開催

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The 38th International Conference of Photopolymer Science and Technology

2021年6月15日〜7月14日オンライン開催

[A-43][Invited] A Holistic Approach to Understanding the Ultrafast Molecular Dynamics of Resist During EUV Exposure: An Introduction to IMEC's AttoLab for Ultrafast Kinetics and Sub-20 nm Pitch Lithography

John Petersen (1), Kevin M. Dorney (1), Fabian Holzmeier (1), Esben W. Larsen (1), Thomas Nuytten (1), Dhirendra P. Singh (1), Michiel van Setten (1), Pieter Vanelderen (1), Clayton Bargsten (2), Seth L. Cousin (2), Daisy Raymondson (2), Eric Rinard (2), Rod Ward (2), Henry Kapteyn (2,3), Stefan Böttcher (4), Oleksiy Dyachenko (4), Raimund Kremzow (4), Marko Wietstruk (4), Geoffrey Pourtois (1), Paul van der Heide (1)((1) IMEC, (2) KM Labs, (3) University of Colorado Boulder and NIST, (4) SPECS GmbH)

25min.

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