1973 International Conference on Solid State Devices
1973年8月29日〜8月31日The Tokyo Chamber of Commerce and Industry, Tokyo, Japan
1973 International Conference on Solid State Devices
1973年8月29日〜8月31日The Tokyo Chamber of Commerce and Industry, Tokyo, Japan
[2-4]Anomalous Enhancement of Etching Rate of Silicon Nitride with HF Etchant by Ion Implantation
Y. Akasaka、K. Horie K. Nomura、S. Kawazu(1.Central Research Laboratory, Mitsubishi Electric Corp.、2.Kitaitami Works)
