1978 Conference on Solid State Devices

1978 Conference on Solid State Devices

1978年8月29日〜8月30日The Tokyo Chamber of Commerce and Industry, Tokyo, Japan
International Conference on Solid State Devices and Materials
1978 Conference on Solid State Devices

1978 Conference on Solid State Devices

1978年8月29日〜8月30日The Tokyo Chamber of Commerce and Industry, Tokyo, Japan

[A-5-2]Deep Levels Introduced by Iron Implantation in N-Type Silicon and Its Application to Switching Devices

H. Hayashi、T. Mamine、T. Matsushita、O. Kumagai、K. Nishiyama、K. Kaneko(1.SONY Corporation Semiconductor Development Division and Research Center)
https://doi.org/10.7567/SSDM.1978.A-5-2