1978 Conference on Solid State Devices

1978 Conference on Solid State Devices

1978年8月29日〜8月30日The Tokyo Chamber of Commerce and Industry, Tokyo, Japan
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International Conference on Solid State Devices and Materials
1978 Conference on Solid State Devices

1978 Conference on Solid State Devices

1978年8月29日〜8月30日The Tokyo Chamber of Commerce and Industry, Tokyo, Japan

[C-2-3]High Rate Deposition of ZnO Film Using Improved DC Reactive Magnetron Sputtering Technique

Tomonobu Hata、Toshiharu Minamikawa、Etsuji Noda、Toshio Hada(1.Faculty of Technology, Kanazawa University)
https://doi.org/10.7567/SSDM.1978.C-2-3
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