1979 International Conference on Solid State Devices

1979 International Conference on Solid State Devices

1979年8月27日〜8月29日The Tokyo Chamber of Commerce and Industry, Tokyo, Japan
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International Conference on Solid State Devices and Materials
1979 International Conference on Solid State Devices

1979 International Conference on Solid State Devices

1979年8月27日〜8月29日The Tokyo Chamber of Commerce and Industry, Tokyo, Japan

[A-3-3]Short Channel MOS FET's Fabricated by Self-Aligned Ion Implantation and Laser Annealing

M. Miyao、M. Koyanagi、H. Tamura、N. Hashimoto、T. Tokuyama(1.Central Research Laboratory、2.Hitachi Ltd.)
https://doi.org/10.7567/SSDM.1979.A-3-3
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