1979 International Conference on Solid State Devices

1979 International Conference on Solid State Devices

1979年8月27日〜8月29日The Tokyo Chamber of Commerce and Industry, Tokyo, Japan
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International Conference on Solid State Devices and Materials
1979 International Conference on Solid State Devices

1979 International Conference on Solid State Devices

1979年8月27日〜8月29日The Tokyo Chamber of Commerce and Industry, Tokyo, Japan

[A-3-4]Resistivity Reduction of Polycrystalline Silicon Films by Laser Annealing

Susumu KOHYAMA、Shinji ONGA、Kenji SHIBATA、Hisakazu IIZUKA(1.Semiconductor Device Engineering Lab. Toshiba Corporation)
https://doi.org/10.7567/SSDM.1979.A-3-4
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