1980 Conference on Solid State Devices

1980 Conference on Solid State Devices

1980年8月26日〜8月27日The Tokyo Chamber of Commerce and Industry, Tokyo, Japan
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International Conference on Solid State Devices and Materials
1980 Conference on Solid State Devices

1980 Conference on Solid State Devices

1980年8月26日〜8月27日The Tokyo Chamber of Commerce and Industry, Tokyo, Japan

[B-3-4]Improvement in CZ Wafers by Reducing Oxygen Impurity

Keigo Hoshikawa、Hiroki Kohda、Kenji Ikuta(1.Musashino Electrical Communication Laboratory, NTT)
https://doi.org/10.7567/SSDM.1980.B-3-4
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