1981 Conference on Solid State Devices

1981 Conference on Solid State Devices

1981年8月26日〜8月27日The Tokyo Chamber of Commerce and Industry, Tokyo, Japan
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International Conference on Solid State Devices and Materials
1981 Conference on Solid State Devices

1981 Conference on Solid State Devices

1981年8月26日〜8月27日The Tokyo Chamber of Commerce and Industry, Tokyo, Japan

[A-4-2]Recrystallization of Silicon Film on Nitride/Oxide double Insulating Structure by CW Laser Irradiation

T. Nishimura、H. Sakurai、S. Nagao、T. Isu、Y. Akasaka、N. Tsubouchi(1.LSI Development Laboratory, Mitsubishi Electric Corporation、2.Central Research Laboratory, Mitsubishi Electric Corporation)
https://doi.org/10.7567/SSDM.1981.A-4-2
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