1981 Conference on Solid State Devices

1981 Conference on Solid State Devices

1981年8月26日〜8月27日The Tokyo Chamber of Commerce and Industry, Tokyo, Japan
戻る
International Conference on Solid State Devices and Materials
1981 Conference on Solid State Devices

1981 Conference on Solid State Devices

1981年8月26日〜8月27日The Tokyo Chamber of Commerce and Industry, Tokyo, Japan

[B-2-8]Optimization of GD a-Si:H Film Property for Photovoltaic Devices by Means of the Cross Field Plasma Deposition Technique

S. Hotta、N. Nishimoto、Y. Tawada、H. Okamoto、Y. Hamakawa(1.Faculty of Engineering Science, Osaka University)
https://doi.org/10.7567/SSDM.1981.B-2-8
PDFダウンロードPDFダウンロード
戻る