1983 Conference on Solid State Devices and Materials

1983 Conference on Solid State Devices and Materials

1983年8月30日〜9月1日The Tokyo Chamber of Commerce and Industry, Tokyo, Japan
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International Conference on Solid State Devices and Materials
1983 Conference on Solid State Devices and Materials

1983 Conference on Solid State Devices and Materials

1983年8月30日〜9月1日The Tokyo Chamber of Commerce and Industry, Tokyo, Japan

[A-1-2]Study on Formation of Solid-Phase-Epitaxial CoSi2, Films and Patterning Effects

Kouichirou Ishibashi、Hiroshi Ishiwara、Seijiro Furukawa(1.Graduate School of Science and Engineering, Tokyo Institute of Technology)
https://doi.org/10.7567/SSDM.1983.A-1-2
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